SAKAGUCHI Atomic-level anti-aliased heat treatment minimal device (minimal laser hydrogen annealing device)

SAKAGUCHI 

Atomic-level anti-aliased heat treatment minimal device (minimal laser hydrogen annealing device)

Specifications:

·       φ12.5mm wafer (sheet-leaf treatment)

·       Compact housing (about 30 cm wide)

·       No need for a clean room

·       Low power consumption (rated AC100V 10A)

·       Ultra-high vacuum compatible (5 × 10 -5 Pa or less)

·       Rapid temperature rise and fall (2.5 seconds to 1100℃)

·       Stable temperature control (1100℃±0.5℃)

·       Uniform temperature distribution (variability (σ/Ave.) 0.5%)